Advances in Applied Science and Technology Vol. 3

This book covers key areas of applied science & technology and other related fields (theme: physics and chemistry). The contributions by the authors include physics, chemistry, Stern-Gerlach experiment, atomic magnetic moment, plane wave function, resonance frequency, cantilever, Ansys Workbench, MEM actuators, adsorption, Congo red, nanocomposite, digital circuit design, pulsed laser deposition, SILAR method, thin films, semiconductor, film thickness, Radius of event horizon, XRBs and AGN, physicochemical characterization, flow-distance, correlation, industrial wastewaters, Pollution, nitrophenol, isotherm, kinetics, binary, ternary, transient process, heterogeneous hyperchaotic system, thermodynamic category, Tsallis entropy, pyridoxine hydrochloride, reversed phase, copper, corrosion inhibition, organic inhibitor, electrochemistry etc. This book contains various materials suitable for students, researchers and academicians in the field of applied science & technology (theme: physics and chemistry).