Nanostructure Thin Films Prepared by Using PLD and SILAR Method

  • Ho Soon Min Centre for Green Chemistry and Applied Chemistry, INTI International University, Putra Nilai, 71800, Negeri Sembilan, Malaysia
Keywords: pulsed laser deposition, SILAR method, thin films, semiconductor, film thickness

Abstract

There are several types of binary, ternary and quaternary thin films have been prepared using pulsed laser deposition (PLD) and successive ion layer adsorption and reaction (SILAR) method. These methods have many advantages such as able to control the dimensions, the growth rate, film thickness and produce nano-particles. In this work, PLD and SILAR methods were briefly discussed. Experimental results for the films prepared using these two deposition techniques from literature review will be described.  Characterization of thin films using various tools (SEM, EDAX, XRD, XPS, FTIR, UV-Visible spectrophotometer, Raman Spectra) showed these deposition techniques were suitable to prepare metal chalcogenide thin films.

Published
2019-06-20
How to Cite
Min, H. S. (2019). Nanostructure Thin Films Prepared by Using PLD and SILAR Method. Advances in Applied Science and Technology Vol. 3, 145-159. Retrieved from https://stm1.bookpi.org/index.php/aast-v3/article/view/143
Issue
Advances in Applied Science and Technology Vol. 3
Section
Chapters