Review on Chemical Bath Deposited Nanostructured Thin Films in the Presence of Complexing Agent
Theory and Applications of Chemistry Vol. 1,
Page 30-39
Abstract
There are many nanostructured thin films (such as binary and ternary compounds) have been prepared using simple chemical bath deposition technique. These films were deposited onto various substrates under different experimental conditions. During the deposition process, complexing agent will be added to improve quality of films. In this work, an analysis was carried out to investigate the growth of films in the presence of complexing agent. Researchers conclude that complexing agent controls cation ions during the deposition process. Aa a result, can produce uniform surface and control deposition rate as well.
Keywords:
- Semiconductor
- deposition
- x-ray diffraction
- chemical bath deposited films
- complexing agent
How to Cite
Min, H. S. (2019). Review on Chemical Bath Deposited Nanostructured Thin Films in the Presence of Complexing Agent. Theory and Applications of Chemistry Vol. 1, 30-39. Retrieved from https://stm1.bookpi.org/index.php/tac-v1/article/view/96
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